Thin Film characterization are important in the development phase of new materials to minimize the time to market of a new generation of devices and in the metrology step, which is required for improving the yield of a production line for minimizing wafer-to-wafer variation. 蓝鲸体育直播 a leader in optical spectroscopy from deep UV to XRF offers a unique range of high-end tools for Materials and Thin Film Analysis which can used in R&D, In-Line or integrated in a process chamber.
Key Benefits:
Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm
In-situ spectroscopic ellipsometer for real-time thin film monitoring
Spectroscopic Ellipsometer for Simple Thin Film Measurement
AFM-Raman for Physical and Chemical imaging
AFM-Raman for physical and chemical imaging
Camera Endpoint Monitor based on Real Time Laser Interferometry
校 胁邪褋 械褋褌褜 胁芯锌褉芯褋褘 懈谢懈 锌芯卸械谢邪薪懈褟? 袠褋锌芯谢褜蟹褍泄褌械 褝褌褍 褎芯褉屑褍, 褔褌芯斜褘 褋胁褟蟹邪褌褜褋褟 褋 薪邪褕懈屑懈 褋锌械褑懈邪谢懈褋褌邪屑懈.
